Course: Physical Methods of Deposition

« Back
Course title Physical Methods of Deposition
Course code KFY/P223
Organizational form of instruction Lecture
Level of course Master
Year of study 2
Semester Summer
Number of ECTS credits 4
Language of instruction English
Status of course Compulsory-optional
Form of instruction Face-to-face
Work placements This is not an internship
Recommended optional programme components None
Lecturer(s)
  • Matoušek Jindřich, Mgr. Ph.D.
Course content
unspecified

Learning activities and teaching methods
unspecified
Learning outcomes
Prerequisites
Teaching in English is meant only for erasmus and foreign students. In the case of a small number of students is teaching in a form of individual consultations.

Assessment methods and criteria
unspecified
Recommended literature
  • Eckertová L. Fyzika tenkých vrstev.
  • Eckertová, L., Růžička, T. Growth and Applications of Thin Films.
  • Mattox D.M. Handbook of physical vapor deposition (PVD) processing, Noyes Publications.
  • Musil J., Vyskočil J. Tenké vrstvy nitridu titanu.


Study plans that include the course
Faculty Study plan (Version) Category of Branch/Specialization Recommended year of study Recommended semester
Faculty: Faculty of Science Study plan (Version): Applied Nanotechnology (A12) Category: Special and interdisciplinary fields 2 Recommended year of study:2, Recommended semester: Summer